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首页> 外文会议>2014 International Symposium on Optomechatronic Technologies >An Investigation on the Effect of Curvatures and Corners along Path
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An Investigation on the Effect of Curvatures and Corners along Path

机译：路径上曲率和拐角的影响研究

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摘要

The unit removal function (URF) of special tools and tool paths are required for the modern sub-aperture deterministic polishing technologies. Paths may affect the amount of removed material because of the curvatures and corners existing on them. This study proposes a mathematic model along path for analyzing the effects of curvatures and corners on material removal during polishing. A numerical method was used to calculate the integration of segments covered by the URF. The length covered by the URF was also determined to predict the amount of material removed from a given location of a path. For the effects of curvatures, the maximum material removed is a distance of about 0.5 to the normalized radius of the URF. For the effects of corners, the peak removal is a distance between 0.5 and 1 to a corner. The Harris corner detection algorithm was used to estimate corner distribution. Aside from curvatures and corners, the space between adjacent paths is another key parameter that affects the amount of removed material. The combined effect of curvatures, corners, and spaces was comprehensively analyzed, and two typical paths -- spiral and raster paths -- were introduced in polishing experiments. The experimental results are consistent with the numerical prediction.
机译：现代子孔径确定性抛光技术需要专用工具和工具路径的单元去除功能（URF）。由于路径上存在曲率和拐角，路径可能会影响去除的材料量。这项研究提出了一个沿路径的数学模型，用于分析曲率和拐角对抛光过程中材料去除的影响。使用数值方法来计算URF覆盖的分段的积分。还确定了URF覆盖的长度，以预测从路径的给定位置移除的材料量。对于曲率的影响，所去除的最大材料是到URF标准化半径的大约0.5距离。对于拐角的影响，峰去除是到拐角的0.5到1之间的距离。哈里斯角点检测算法用于估计角点分布。除了曲率和拐角之外，相邻路径之间的间隔是另一个影响已去除材料量的关键参数。全面分析了曲率，拐角和空间的组合效果，并在抛光实验中引入了两个典型路径（螺旋路径和光栅路径）。实验结果与数值预测吻合。

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