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Enhanced-oxidation and interface modification on 4H-SiC(0001) substrate using Alkaline earth metal

机译:碱土金属在4H-SiC(0001)衬底上的增强氧化和界面改性

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摘要

Summary form only given. The complete presentation was not made available for publication as part of the conference proceedings. Enhanced-oxidation of 4H-SiC and interface modification with BaO2 was investigated. The enhanced oxidation of 4H-SiC was drastically dependent on pre-deposited BaO2 thickness. At the oxidation time of 300 min, oxide thicknesses for BaO2 of 2.8 nm and 7.8 nm were 91.8 nm and 26.2 nm, respectively. The physical state of Ba in the oxide was investigated by XPS and 2D-GIXD. At thick BaO2 with a thickness of over 6.4 nm, bridged oxygen and non-bridged oxygen were observed in O1s state. This results shows barium silicate was formed in SiO2 at BaO2 thickness of over 6.4 nm.
机译:仅提供摘要表格。完整的演示文稿未作为会议记录的一部分公开发布。研究了4H-SiC的增强氧化和BaO2的界面改性。 4H-SiC的增强氧化极大地取决于预沉积的BaO2厚度。在300分钟的氧化时间下,BaO2的2.8 nm和7.8 nm的氧化物厚度分别为91.8 nm和26.2 nm。通过XPS和2D-GIXD研究了氧化物中Ba的物理状态。在厚度超过6.4 nm的厚BaO2处,在O1s状态下观察到桥接氧和非桥接氧。该结果表明在SiO 2中以超过6.4nm的BaO 2厚度形成了硅酸钡。

著录项

  • 来源
  • 会议地点 Halkidiki(GR)
  • 作者单位

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

    Research Institute for Nanodevice and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, Higashihiroshima, Hiroshima, 739-8527, Japan;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Barium; Silicon carbide; MOSFET; Substrates; MOS capacitors; Oxidation;

    机译:钡;碳化硅; MOSFET;基板; MOS电容器;氧化;

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