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首页> 外文会议>22nd Annual Semiconductor Pure Water and Chemicals Conference Feb 17-19, 2003 Santa Clara, CA >Correlation of HF Assay and Standard-Free ICP-MS Determination of Trace Metals in Process Chemicals
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Correlation of HF Assay and Standard-Free ICP-MS Determination of Trace Metals in Process Chemicals

机译：HF测定法与无标准ICP-MS测定工艺化学品中痕量金属的相关性

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摘要

This study adopted the commonly used titration method for the assay determination of diluted HF sample when performed by different models of autotitrators. To improve the Lab method for the accurate measurement and to evaluate the data output consistency, one-way ANOVA (Analysis of Variance) statistical method was implemented in the final analysis to confirm the effectiveness of improvement. The final result showed no significant difference between laboratories after key factors were fixed. An ICP-MS with PFA nebulizer was applied for the spike recovery test of various semiconductor interesting metal impurities in APM (Ammonia Peroxide Mixture), HPM (Hydrogen Chloride Peroxide Mixture), diluted & concentrated HF (Hydrofluoric Acid) and BOE (Buffer Oxide Etchant), by direct sample introduction and analysis without matrix elimination procedure. The spike recoveries of studied elements, except the off-ranged Al in APM and diluted HF, were all located in the range of 80%-120% with a 5 ppb spiked solution in the various chemicals under the hot plasma mode. The semi-quantitative model is particularly valuable for Na, Al, Fe and Cu among the studied elements when Co played as a standard in hot plasma mode.
机译：这项研究采用了常用的滴定法，当用不同型号的自动滴定仪进行测定时，测定稀释的HF样品。为了改进实验室方法以进行准确的测量并评估数据输出的一致性，最终分析中采用了单向ANOVA（方差分析）统计方法以确认改进的有效性。最终结果表明，固定关键因素后，实验室之间没有显着差异。带有PFA雾化器的ICP-MS用于APM（过氧化氢混合物），HPM（过氧化氢混合物），稀和浓HF（氢氟酸）和BOE（缓冲氧化物蚀刻剂）中各种半导体有趣的金属杂质的加标回收测试。 ），直接进行样品引入和分析，而无需基质消除程序。在热等离子体模式下，除了5 ppb的加标溶液外，所研究元素的加标回收率（除APM中超限的Al和稀释的HF以外）均位于80％-120％的范围内。当Co在热等离子体模式下作为标准时，半定量模型对于所研究元素中的Na，Al，Fe和Cu尤其有价值。

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