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首页> 外文会议>22nd Annual Semiconductor Pure Water and Chemicals Conference Feb 17-19, 2003 Santa Clara, CA >On-Line Monitoring Of BTA In Copper CMP
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On-Line Monitoring Of BTA In Copper CMP

机译：铜CMP中BTA的在线监测

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摘要

Benzotriazole or BTA (C_6H_5N_3) is established as an effective copper corrosion inhibitor. CMP (Chemical Mechanical Planarization) is an enabling technology for copper damascene in the fabrication of high speed semiconductor devices, thus copper CMP is a relatively new process for most users. BTA is often added to the CMP polisher rinse and/or to the CMP slurry, to inhibit copper corrosion. Recently it has been demonstrated that BTA concentration which is outside the target range, either too low or too high, can cause defects and reduce yield in copper semiconductor fabrication. Therefore, effective copper CMP process control requires measurement of the BTA concentration in the incoming drums, plus continuous on-line monitoring of the chemical delivery system. This paper describes an accurate, stable, robust BTA monitor, suitable for both continuous online monitoring and batch sampling. The instrument utilizes the powerful differential absorption spectroscopic measurement technique. It does not consume chemicals, nor does it produce a waste stream. The measurement technique, calibration and performance data are discussed.
机译：建立了苯并三唑或BTA（C_6H_5N_3）作为有效的铜腐蚀抑制剂。 CMP（化学机械平面化）是铜镶嵌在高速半导体器件制造中的一项使能技术，因此，对于大多数用户而言，铜CMP是相对较新的工艺。通常将BTA添加到CMP抛光机冲洗液和/或CMP浆料中，以抑制铜腐蚀。最近，已经证明，目标范围之外的BTA浓度太低或太高都会导致铜半导体制造中的缺陷并降低产量。因此，有效的铜CMP工艺控制需要测量进料桶中的BTA浓度，以及对化学品输送系统进行连续在线监测。本文介绍了一种准确，稳定，强大的BTA监视器，适用于连续在线监视和批量采样。该仪器采用了强大的差分吸收光谱测量技术。它不消耗化学物质，也不产生废物流。讨论了测量技术，校准和性能数据。

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