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PHOTOLUMINESCENCE MEASUREMENTS OF ZnO HETEROSTRUCTURES

机译:ZnO异质结结构的光致发光测量

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摘要

ZnO thin films were grown on TbAlO_3 single crystal substrates by pulsed laser deposition. In photoluminescence (PL) measurements, strong emissions from TbAlO_3 were observed with the emission from ZnO when the film thickness was less than 100nm. The relationship between the ZnO film thickness and the emission intensity from TbAlO_3 was investigated in order to determine the penetration depth of excitation light. Information on the heterostructures ranging from the surface to a depth of 300nm was obtained by PL measurements in this study, and the absorption coefficient for a wavelength of 325nm was estimated to be 1.31 x10~5 cm~(-1).
机译:通过脉冲激光沉积在TbAlO_3单晶衬底上生长ZnO薄膜。在光致发光(PL)测量中,当膜厚度小于100nm时,观察到TbAlO_3产生强发射,而ZnO产生发射。为了确定激发光的穿透深度,研究了ZnO膜厚度与TbAlO_3的发射强度之间的关系。本研究通过PL测量获得了从表面到300nm深度的异质结构信息,对325nm波长的吸收系数估计为1.31 x10〜5 cm〜(-1)。

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