Use a Theoretical Model to Investigate Reactive Sputtering of AlN Thin Films

机译：使用理论模型研究AlN薄膜的反应溅射

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In order to understand the physical and chemical processes of aluminium nitride thin films preparated by reactive sputtering, a reactive sputtering model model was developed. The mode of controlled cathode volatge at constant flow rates are investigated for the purpose of controlling the stoichimetry of AlN films. The mode is shown to provide a means for stable operation for any degree of target coverage.

机译：为了了解反应溅射制备氮化铝薄膜的物理和化学过程，建立了反应溅射模型模型。为了控制AlN薄膜的化学计量，研究了恒定流速下受控阴极挥发的模式。该模式显示为任何程度的目标覆盖范围提供了稳定运行的手段。

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来源
《第九届真空冶金与表面工程学术会议》|2009年|297-300|共4页
会议地点 Shenyang(CN)
作者
TONG Hong-bo; LIU Qing;
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作者单位

School of Mechanical Engineering, Liaoning Shihua University, Fushun, 113001, China;

School of Mechanical Engineering, Liaoning Shihua University, Fushun, 113001, China;

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会议组织
原文格式 PDF
正文语种 eng
中图分类
关键词
Reactive sputtering; AlN thin films; Model; Stoichimetry;

机译：反应溅射； AlN薄膜；模型;化学计量;

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专利

1. Investigation of dc-reactive magnetron-sputtered AlN thin films by electron microprobe analysis, X-ray photoelectron spectroscopy and polarised infra-red reflection [J] . Manova D., Fukarek W., Karpuzov D., Surface & Coatings Technology . 1998,第2a3期

机译：通过电子探针分析，X射线光电子能谱和偏振红外反射研究直流反应磁控溅射AlN薄膜
2. Deposition of AlN and oxidized AlN thin-films by reactive sputtering: Correlation between film growth and deposition parameters [J] . Garcia-Mendez M, Morales-Rodriguez S, Ramirez LE, Surface review and letters . 2008,第4期

机译：反应溅射沉积AlN和氧化的AlN薄膜：膜生长与沉积参数之间的关系
3. Spectroellipsometric investigation of optical, morphological, and structural properties of reactively sputtered polycrystalline AlN films [J] . Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films . 2010,第3期

机译：分光光度法研究反应溅射多晶AlN薄膜的光学，形态和结构性质
4. Use a Theoretical Model to Investigate Reactive Sputtering of AlN Thin Films [C] . Vacuum metallurgy and surface engineering conference . 2009

机译：使用理论模型来研究AlN薄膜的反应溅射
5. Investigation of reactively sputtered silicon carbon boron nitride thin films for high temperature applications. [D] . Vijayakumar, Arun. 2007

机译：用于高温应用的反应溅射硅碳氮化硼薄膜的研究。
6. Substrate Temperature Dependent Properties of Sputtered AlN:Er Thin Film for In-Situ Luminescence Sensing of Al/AlN Multilayer Coating Health [O] . Liping Fang, Yidong Jiang, Shengfa Zhu, 2018

机译：溅射AlN：Er薄膜的基底温度相关特性用于Al / AlN多层涂层健康的原位发光传感
7. Effect of substrate composition on the piezoelectric response of reactively sputtered AlN thin films [O] . J.A Ruffner, P.G Clem, B.A Tuttle, 1999

机译：基材组成对反应溅射AlN薄膜压电响应的影响
8. Effect of Substrate Composition on the Piezoelectric Response of Reactively Sputtered AlN Thin Films;Thin Solid Films [R] . Clem, P. G. , Dimos, D. B. , Gonzales, D. M. , 1999

机译：基体组成对反应溅射alN薄膜压电响应的影响;薄固体薄膜

Use a Theoretical Model to Investigate Reactive Sputtering of AlN Thin Films

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