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首页> 外文会议>Advances in Resist Technology and Processing XXIII pt.1 >The Effect of Photoresist/Topcoat Properties on Defect Formation in Immersion Lithography
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The Effect of Photoresist/Topcoat Properties on Defect Formation in Immersion Lithography

机译：光刻胶/面漆性能对浸没光刻中缺陷形成的影响

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摘要

The interaction of water with the photoresist film stack is proving to be a key factor in the current generation of 193-nm immersion lithography. Photoresist performance, CD control, optics lifetime, defectivity, overlay and possibly even tool throughput can all be affected by this interaction. Defect control has been an area of increasing concern as the source of the defects can be quite different than that found in conventional dry lithography. Defects can originate from the UPW (Ultra Pure Water) either as particulates or as dissolved solids that precipitate from residual droplets left behind after scanning. Another source of defects can be particulates generated by the immersion fluid as it flows through the exposure tool or as a consequence of water contact with the resist film or resist/topcoat film stack. Recently there have been reports of printable defects due to stains or "watermarks" on the surface of the photoresist. In this report we describe techniques for the visualization of watermarking and particulate formation on a variety of film surfaces. We also describe experiments testing the staining of a variety of water contaminants and additives and their effect on imaging performance. We will also describe the effect of different topcoats on imaging and defectivity in terms of their surface properties.
机译：事实证明，水与光致抗蚀剂薄膜叠层的相互作用是当前193 nm浸没式光刻技术中的关键因素。光刻胶的性能，CD控制，光学器件的使用寿命，缺陷率，覆盖率以及甚至工具的产量都可能受到这种相互作用的影响。由于缺陷的来源可能与传统干法光刻中发现的来源完全不同，因此缺陷控制一直是人们日益关注的领域。 UPW（超纯水）的缺陷可能是微粒或溶解的固体，这些微粒或固体从扫描后留下的残留液滴中沉淀出来。缺陷的另一个来源可能是浸入流体在流经曝光工具时或由于水与抗蚀剂膜或抗蚀剂/面漆膜叠层接触而产生的颗粒。最近，有报道说由于光致抗蚀剂表面上的污点或“水印”而引起的可印刷缺陷。在本报告中，我们描述了用于可视化各种胶片表面上的水印和微粒形成的技术。我们还描述了测试各种水污染物和添加剂的染色及其对成像性能的影响的实验。我们还将根据其表面性质来描述不同面漆对成像和缺陷的影响。

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