Benchmarking of Advanced CD-SEMs against the New Unified Specification for sub-0.18 Micrometer Lithography

机译：针对低于0.18微米光刻的新统一规范对高级CD-SEM进行基准测试

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The Advnaced Metrology Advisory Group (AMAG) comprised of representatives from International SEMATECH consortium member companies and the National Insitute of Standards and Technology have joined to develop a new unified specification for an advanced scanning electron microscopy critical dimension measurement instrument (CD-SEM). (Allgair, et al., 1998) this paper describes the results of an effort to benchmark six CD-SEM instruments according to this specification.

机译：由国际SEMATECH财团成员公司和国家标准与技术研究所的代表组成的高级计量学咨询小组（AMAG）已加入，为高级扫描电子显微镜临界尺寸测量仪（CD-SEM）制定了新的统一规范。（Allgair等，1998）本文描述了根据该规范对六种CD-SEM仪器进行基准测试的结果。

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来源
《Conference on Challenges in Process Integration and Device Technology 18-19 September 2000 Santa Clara, USA》|2000年|p.42-57|共16页
会议地点 Santa Clara CA(US)
作者
Alain G.Deleporte; John Allgair; Charles Archie; G.William Banke; Michael T.Postek; Jerry Schlesinger; Andras E.Vladar; Arnold Yanof;
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原文格式 PDF
正文语种 eng
中图分类无线电电子学、电信技术;
关键词
CD-SEM; lithography; metrology; accuracy; linewidth; specification; benchmarking;

机译：扫描电镜光刻计量准确性;行宽;规格;基准测试;

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2. A neutronic benchmark specification and COMET solution for the Advanced Burner Test Reactor [J] . Ulmer Richard M., Rahnema Farzad, Connolly Kevin John Annals of nuclear energy . 2016,第JANaPTa1期

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4. Benchmarking of Advanced CD-SEMs against the New Unified Specification for sub-0.18 Micrometer Lithography [C] . Alain G.Deleporte, John Allgair, Charles Archie, Conference on challenges in process integration and device technology . 2000

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Benchmarking of Advanced CD-SEMs against the New Unified Specification for sub-0.18 Micrometer Lithography

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