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首页> 外文会议>Conference on Emerging Lithographic Technologies VIII pt.2; 20040224-20040226; Santa Clara,CA; US >Ion damage analysis on EUV collector mirrors
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Ion damage analysis on EUV collector mirrors

机译：EUV集电极镜上的离子损伤分析

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摘要

Collector mirror lifetime evaluation and damage prevention are important technical challenge for the EUV light source development. High-energy xenon ions emitted from laser-produced EUV plasmas are expected to considerably damage the collector mirror of the light source. Related to future collector mirror lifetime considerations, fast ions from the laser-produced plasma have been characterized by time-of -flight (TOF) measurements. Using a low repetition rate 8-ns, 100-mJ Nd:YAG laser, Xe~+ to Xe~(6+) ions were observed with Xe~(2+) being the main charge state. In addition, the effects of fast ions on Mo/Si multilayer mirrors have been studied using a Xe ion gun. Ion sputtering of the multilayer structure is the main damage mechanism but layer boundary mixing and surface roughness increase are also observed. A magnetic confinement scheme is evaluated for ion mitigation.
机译：集光镜寿命评估和损坏预防是EUV光源开发的重要技术挑战。预计从激光产生的EUV等离子体发射的高能氙离子会严重损坏光源的集光镜。与未来收集器镜寿命的考虑有关，来自激光产生等离子体的快离子已通过飞行时间（TOF）测量进行了表征。使用低重复率的8-ns，100-mJ Nd：YAG激光器，观察到Xe〜（2+）为主要电荷状态的Xe〜+至Xe〜（6+）离子。此外，已经使用Xe离子枪研究了快离子对Mo / Si多层反射镜的影响。多层结构的离子溅射是主要的破坏机理，但也观察到层边界混合和表面粗糙度增加。评估了磁约束方案的离子缓解效果。

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