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首页> 外文会议>Conference on Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications VIII, Jul 9-11, 2002, Seattle, Washington, USA >High-speed light induced photo refractive change in hydrogenated amorphous silicon
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High-speed light induced photo refractive change in hydrogenated amorphous silicon

机译：氢化非晶硅中的高速光致光折变

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摘要

In recent years the prospect of engineering an integrated photonic technology based on amorphous silicon-based has focused efforts on providing a unified understanding of the optical properties of this material. From a optical properties prospective the science of amorphous silicon is most transparent from a nano-crystalline material framework. Of particular interest for photonic engineering is the tunable range of the refractive index in amorphous silicon, the fast and slow light induced changes in epsilon 1 and 2, the means by which to deposit films of sufficient thickness and smoothness for the photonic application and the relationships among deposition conditions, material properties, and in particular the optical parameters. The present work reviews some of the previous work and examines the experimental and theoretical basis for the fast light induced refractive index change with the hope of providing the insight needed for device engineering. This work suggests several novel designs for light amorphous silicon based light valves and other devices.
机译：近年来，对基于非晶硅的集成光子技术进行工程设计的前景已集中于对这种材料的光学特性进行统一理解。从光学特性的角度来看，从纳米晶体材料的框架来看，非晶硅的科学是最透明的。光子工程学特别感兴趣的是非晶硅中折射率的可调范围，ε1和2中光的快慢引起的变化，用于沉积厚度和光滑度足以用于光子应用的膜的方法及其关系沉积条件，材料特性，尤其是光学参数。本工作回顾了一些以前的工作，并检验了快速光诱导的折射率变化的实验和理论基础，希望为器件工程提供所需的见识。这项工作为基于光非晶硅的光阀和其他设备提出了几种新颖的设计。

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