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Damage formation and characterization with scanning photoemission spectromicroscopy

机译:扫描光发射光谱显微镜观察损伤的形成和表征

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Scanning photoemission spectromicroscopy is a powerful tool for the chemical characterization of materials based on third generation synchrotron light sources. Due to the X-ray focalization properties it represents also an extremely bright source of radiation ideal for the investigation of radiation effects on matter. Despite the experiments involving inorganic materials, such as oxides, lead in the last decade have already shed light on the potentials of this techniques to perform lateral resolved chemical analysis, still there is a lack of information concerning the possibilities to measure organic compounds. This paper reports on the investigation of inorganic (Rh oxide thin films) and organic (polymers) samples performed with the scanning photoemission microscope hosted at the Elettra Synchrotron Light Laboratory. Results show that the typical photon densities in the focused spot of the microscope allow the investigation of the oxide films but produce an immediate damaging of the polymeric film.
机译:扫描光发射光谱显微镜是基于第三代同步加速器光源对材料进行化学表征的强大工具。由于X射线聚焦特性,它也代表了非常明亮的辐射源,非常适合研究物质上的辐射效应。尽管在过去的十年中,涉及无机材料(例如氧化物)的铅的实验已经阐明了该技术进行横向解析化学分析的潜力,但仍然缺乏有关测量有机化合物可能性的信息。本文报道了使用Elettra Synchrotron Light实验室的扫描光发射显微镜对无机(Rh氧化物薄膜)和有机(聚合物)样品进行的研究。结果表明,显微镜聚焦点的典型光子密度允许研究氧化膜,但会立即损坏聚合物膜。

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