Improved proximity correction algorithm for electron-beam lithography

机译：改进的电子束光刻接近校正算法

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Abstract: An improved proximity effect correction method based on pattern division, which attempts to correct both for inter- and for intra-shape proximity effects, is proposed. The experimental results suggest that the algorithm has good convergence, fast data processing speed, and good correction effects. Compared with the method based on transform, our approach has apparent better correction effects. !20

机译：摘要：提出了一种改进的基于模式划分的校正方法，该方法试图校正形状间和形状内的邻近效应。实验结果表明，该算法收敛性好，数据处理速度快，校正效果好。与基于变换的方法相比，我们的方法具有明显更好的校正效果。！20

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来源
《Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV》|1994年|p.323-330|共8页
会议地点 San Jose CA(US)
作者
Wu Lu; Southeast Univ.; Nanjing; China; Haoying Y. Shen; Nanjing Electronic Device Institute; Nanjing; China; Jingxin X. Tao; Southeast Univ.; Nanjing; China; Ning Gu; Southeast Univ.; Nanjing; China; Yu Wei; Southeast Univ.; Nanjing; China.;
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正文语种 eng
中图分类无线电电子学、电信技术;
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1. High contrast 3D proximity correction for electron-beam lithography: An enabling technique for the fabrication of suspended masks for complete device fabrication within an UHV environment [J] . Rosamond Mark C., Batley Joseph T., Burnell Gavin, Microelectronic Engineering . 2015,第auga1期

机译：用于电子束光刻的高对比度3D接近校正：一种用于制造悬浮掩模的使能技术，用于在超高压环境中完成器件制造
2. Proximity-effect correction in electron-beam lithography on metal multi-layers [J] . Yi H, Chang J Journal of Materials Science . 2007,第13期

机译：金属多层电子束光刻中的邻近效应校正
3. Proximity-effect correction in electron-beam lithography on metal multi-layers [J] . Hyunjung Yi, Joonyeon Chang Journal of Materials Science . 2007,第13期

机译：金属多层电子束光刻中的邻近效应校正
4. Improved proximity correction algorithm for electron-beam lithography [C] . Wu Lu, Haoying Y. Shen, Jingxin X. Tao, Conference on electron-beam, x-ray, and ion-beam submicrometer lithographies for manufacturing . 1994

机译：改进的电子束光刻接近校正算法
5. Compensation of extreme ultraviolet lithography image field edge effects through optical proximity correction. [D] . Maloney, Chris. 2014

机译：通过光学邻近校正来补偿极紫外光刻图像场边缘效应。
6. Publisher Correction: Development and validation of a deep learning algorithm for improving Gleason scoring of prostate cancer [O] . Kunal Nagpal, Davis Foote, Yun Liu, 2019

机译：出版商更正：深度学习算法的开发和验证该算法可改善前列腺癌的Gleason评分
7. High contrast 3D proximity correction for electron-beam lithography: An enabling technique for the fabrication of suspended masks for complete device fabrication within an UHV environment [O] . Rosamond MC, Batley J, Burnell G, 2015

机译：用于电子束光刻的高对比度3D接近校正：用于制造悬挂掩模的使能技术，用于在UHV环境中完成器件制造
8. A Proximity effect Correction Program for Electron Beam Lithography [R] . Berkowitz, H. L., Lux, R. A. 1982

机译：电子束光刻的邻近效应校正程序

Improved proximity correction algorithm for electron-beam lithography

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