首页> 外文会议>Gettering and defect engineering in semiconductor technology XVI >Investigations of critical structural defects in active layers of GaN-on-Si for power electronic devices
【24h】

Investigations of critical structural defects in active layers of GaN-on-Si for power electronic devices

机译:功率电子器件硅基GaN有源层中关键结构缺陷的研究

获取原文
获取原文并翻译 | 示例

摘要

The influence of structural defects in the active layer of GaN-on-Si substrates on the vertical leakage current was studied. The structural defects were analyzed by analytical scanning electron microscopy by means of cathodoluminescence (CL). The leakage current was determined by vertical I-V measurements. Two possibilities were found, which give potential explanations for the variations of the vertical leakage current: i) Threading dislocations, which may partially form leakage paths, were detected by CL imaging, ii) Variations of the carbon doping, which is used to tune GaN to a semi insulating material were revealed by CL spectroscopy.
机译:研究了GaN-on-Si衬底有源层中的结构缺陷对垂直漏电流的影响。通过分析扫描电子显微镜借助阴极发光(CL)分析结构缺陷。漏电流通过垂直I-V测量确定。发现了两种可能性,这为垂直泄漏电流的变化提供了可能的解释:i)通过CL成像检测到可能部分形成泄漏路径的螺纹位错; ii)用于调整GaN的碳掺杂变化。通过CL光谱法揭示了半绝缘材料的热稳定性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号