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Low threshold field electron emission of diamond films

机译：金刚石薄膜的低阈值场电子发射

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摘要

Since CVD diamond film possesses desirable properties, it has been widely investigated, and much research has been made in this field. In this experiment, we mainly studied the characteristics of field emission from the CVD diamond films. The motivation for the experiment is to gain some insight into a possible emission mechanism. The diamond films are grown using a hot filament chemical vapor deposition, basing on the diamond micro-grits on silicon substrates. And the diamond micro-grits are deposited on silicon substrates using electrophoresis coat method, through a solution of diamond micro-grits in ethyl alcohol. This study has revealed that emission can be obtained at fields as low as 1.8V/μm. And the field emission measurements were carried out at a pressure of 10~(-4)Pa.
机译：由于CVD金刚石膜具有理想的性能，因此已经对其进行了广泛的研究，并且在该领域已经进行了很多研究。在本实验中，我们主要研究了CVD金刚石薄膜的场发射特性。实验的动机是对可能的排放机制有一些了解。金刚石膜是基于硅衬底上的金刚石微格栅，使用热丝化学气相沉积法生长的。然后将金刚石微孔通过金刚石微孔在乙醇中的溶液，通过电泳涂覆法沉积在硅基板上。这项研究表明，可以在低至1.8V /μm的场上获得发射。并在10〜（-4）Pa的压力下进行了场发射测量。

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