首页> 外文会议>International Conference on Nitride Semiconductors(ICNS-5); 20030525-20030530; Nara; JP >Exciton localization in InGaN/GaN single quantum well structures
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Exciton localization in InGaN/GaN single quantum well structures

机译:InGaN / GaN单量子阱结构中的激子定位

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We have performed a detailed investigation of the low temperature (T = 6 K) photoluminescence spectra and recombination lifetimes of localized excitons in a set of InGaN/GaN single quantum wells in which the indium fraction in the quantum well was varied. We found that with increasing indium fraction the photoluminescence peak emission moved to lower energy and the intensities of the phonon replicas relative to the zero-phonon line increased. From a multi-Gaussian fit of the experimental data, we extracted the Huang-Rhys factor (S), a measure of the strength of the exciton coupling with LO-phonons. By comparing experimental S factors with the results of a theoretical model, we found that the excitons localize on a length scale of ~2 nm in our samples.
机译:我们对一组InGaN / GaN单量子阱(其中量子阱中的铟含量发生了变化)的低温(T = 6 K)光致发光光谱和局部激子的复合寿命进行了详细研究。我们发现,随着铟含量的增加,光致发光峰发射移至更低的能量,并且声子复制体相对于零声子线的强度增加。从实验数据的多高斯拟合中,我们提取了Huang-Rhys因子(S),这是激子与LO声子耦合强度的度量。通过将实验性S因子与理论模型的结果进行比较,我们发现激子在样品中的定位范围为〜2 nm。

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