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首页> 外文会议>International Welding/Joining Conference-Korea; 20070510-12; Seoul(KR) >Corrosion Monitoring Characteristics of Plasma RF Sputtered Mg Thin Films under Cyclic Wet-Dry Conditions
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Corrosion Monitoring Characteristics of Plasma RF Sputtered Mg Thin Films under Cyclic Wet-Dry Conditions

机译：循环干湿条件下等离子射频溅射镁薄膜的腐蚀监测特性

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In general, magnesium metal is not used as uncoated material on account of its corrosion characteristic. This work was done by preparing 99.99% pure magnesium coating films by RF magnetron sputtering onto SPCC substrates [1]. The individual preparation conditions of gas pressures and bias voltages were 1×10~(-2)～ 1×10~(-3) Torr and 0V ～ -300V, respectively. The analysis about crystal orientation, morphology and electrochemical characteristic of Mg thin films was performed by using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), electrochemical impedance spectroscopy (EIS) etc.. It is as a results of experiment that the morphology of the sputtered films changed from a columnar structure to a granular structure when Ar gas pressure increased or bias voltage decreased. Also, the prepared Mg thin film's morphology did not have defects and pinholes, and the corrosion resistance was improved by the formation of a homogeneous passive layer.
机译：通常，由于镁金属的腐蚀特性，因此不能将其用作未涂层材料。这项工作是通过在SPCC基板上通过RF磁控溅射制备99.99％的纯镁涂膜来完成的[1]。气压和偏压的单独制备条件分别为1×10〜（-2）〜1×10〜（-3）Torr和0V〜-300V。利用X射线衍射（XRD），场发射扫描电子显微镜（FE-SEM），电化学阻抗谱（EIS）等方法对镁薄膜的晶体取向，形貌和电化学特性进行了分析。实验结果表明，当氩气气压升高或偏压降低时，溅射膜的形貌由柱状结构变为粒状结构。而且，所制备的Mg薄膜的形态没有缺陷和小孔，并且通过形成均匀的钝化层提高了耐腐蚀性。

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