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Corrosion Monitoring Characteristics of Plasma RF Sputtered Mg Thin Films under Cyclic Wet-Dry Conditions

机译：循环湿干燥条件下血浆RF溅射Mg薄膜腐蚀监测特性

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In general, magnesium metal is not used as uncoated material on account of its corrosion characteristic. This work was done by preparing 99.99% pure magnesium coating films by RF magnetron sputtering onto SPCC substrates [1]. The individual preparation conditions of gas pressures and bias voltages were 1×10~(-2)～ 1×10~(-3) Torr and 0V ～ -300V, respectively. The analysis about crystal orientation, morphology and electrochemical characteristic of Mg thin films was performed by using X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM), electrochemical impedance spectroscopy (EIS) etc.. It is as a results of experiment that the morphology of the sputtered films changed from a columnar structure to a granular structure when Ar gas pressure increased or bias voltage decreased. Also, the prepared Mg thin film's morphology did not have defects and pinholes, and the corrosion resistance was improved by the formation of a homogeneous passive layer.
机译：通常，由于其腐蚀特性，镁金属不用为未涂层材料。通过将RF磁控溅射溅射在SPCC基板上制备99.99％的纯镁涂膜来完成这项工作[1]。各个制备条件的气体压力和偏置电压分别为1×10〜（-2）〜1×10〜（-3）托和0V〜-300V。通过使用X射线衍射（XRD），场发射扫描电子显微镜（Fe-SEM），电化学阻抗光谱（EIS）进行Mg薄膜晶体取向，形态和电化学特性的分析..它是一个实验结果：当AR气体压力增加或偏置电压降低时，溅射膜的形态从柱状结构变为粒状结构。而且，制备的Mg薄膜的形态没有缺陷和针孔，并且通过形成均匀的无源层来改善耐腐蚀性。

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