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Structural and interfacial characteristics of thin (<10 nm) SiO(sub 2) films grown by electron cyclotron resonance plasma oxidation on (100) Si substrates.

机译：通过电子回旋共振等离子体氧化在（100）si衬底上生长的薄（<10nm）siO（sub 2）膜的结构和界面特性。

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The feasibility of fabricating ultra-thin SiO(sub 2) films on the order of a few nanometer thickness has been demonstrated. SiO(sub 2) thin films of approximately 7 nm thickness have been produced by ion flux-controlled Electron Cyclotron Resonance plasma ...

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作者
T. D. Nguyen D. A. Carl D. W. Hess M. A. Lieberman R. Gronsky;
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年度 1991
页码 1-16
总页数 16
原文格式 PDF
正文语种 eng
中图分类工业技术;
关键词
EDB/360201; EDB/360204; Electrical Properties; Oxidation; Plasma; Silicon; Silicon Oxides; Synthesis; Thin Films; Transmission Electron Microscopy;

机译：EDB / 360201; EDB / 360204;电学特性;氧化;等离子体;硅;氧化硅;合成;薄膜;透射电子显微镜;

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专利

1. Correlation between interfacial structure and c-axis-orientation of LiNbO3 films grown on Si and SiO2 by electron cyclotron resonance plasma sputtering [J] . Akazawa H, Shimada M Journal of Crystal Growth . 2004,第3a4期

机译：电子回旋共振等离子体溅射在Si和SiO2上生长的LiNbO3薄膜的界面结构与c轴取向的相关性
2. Characteristics of polysilicon thin-film transistor with thin-gate dielectric grown by electron cyclotron resonance nitrous oxide plasma [J] . Jin-Woo Lee, Nae-In Lee IEEE Electron Device Letters . 1997,第5期

机译：电子回旋共振一氧化二氮等离子体生长具有薄栅介质的多晶硅薄膜晶体管的特性
3. Metal-Oxide-Semiconductor-Diode Characteristics with SiO_2 Films Formed by Oxidation and Sputtering Using Electron-Cyclotron-Resonance-Plasma Stream [J] . Kunio SAITO, Yoshito JIN, Toshiro ONO, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2005,第2期

机译：电子-回旋共振-等离子体流氧化与溅射形成SiO_2薄膜的金属-氧化物-半导体-二极管特性
4. Optical and Compositional Analysis of Annealed SiO_x Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition [C] . T. Roschuk, J. Wojcik, P. Mascher Society of Vacuum Coaters Annual Technical Conference; 20040424-29; Dallas,TX(US) . 2004

机译：电子回旋共振等离子体增强化学气相沉积沉积SiO_x薄膜的光学和成分分析
5. Amorphous and microcrystalline silicon thin films grown by photon assisted electron cyclotron resonance chemical vapor deposition for heterojunction solar cells and thin film transistors. [D] . Song, Young Joo. 2000

机译：通过光子辅助的电子回旋共振化学气相沉积法生长的非晶和微晶硅薄膜，用于异质结太阳能电池和薄膜晶体管。
6. Controlling the defects and transition layer in SiO2 films grown on 4H-SiC via direct plasma-assisted oxidation [O] . Dae-Kyoung Kim, Kwang-Sik Jeong, Yu-Seon Kang, -1

机译：通过直接等离子体辅助氧化控制4H-SiC上生长的SiO2膜中的缺陷和过渡层
7. Rapid thermal annealing effects on the structural properties and density of defects in SiO2 and SiNx : H films deposited by electron cyclotron resonance [O] . Mártil de la Plaza Ignacio, Prado Millán Álvaro del, San Andres Serrano Enrique 2000

机译：快速热退火对电子回旋共振沉积的SiO2和SiNx：H薄膜的结构性质和缺陷密度的影响

Structural and interfacial characteristics of thin (<10 nm) SiO(sub 2) films grown by electron cyclotron resonance plasma oxidation on (100) Si substrates.

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