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Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering

机译：氩气/氧气流量比对直流磁控溅射制备TiO2薄膜光催化效率的影响。

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Nanometer polycrystalline anatase TiO2 films were prepared by DC magnetron sputtering after annealing. Photocatalytic experiment reveals that the sample deposited under lower Ar/O2 gas flow ratio shows better degradation activity.

机译：退火后，通过直流磁控溅射制备纳米多晶锐钛矿型TiO2薄膜。光催化实验表明，在较低的Ar / O2气体流量比下沉积的样品具有较好的降解活性。

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《》|2007年|272-273|共2页
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Lin; Zhao; Liping; Lv; Qiu; Jiawen;
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1. Photocatalytic efficiency of TiO2/SnO2 thin film stacks prepared by DC magnetron sputtering [J] . Kanai N, Nuida T, Ueta K, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2004,第3a4期

机译：直流磁控溅射制备TiO2 / SnO2薄膜叠层的光催化效率
2. Effect of the nitrogen-oxygen ratio on the position of N atoms in the TiO2 lattice of N-doped TiO2 thin films prepared by DC magnetron sputtering [J] . Wu Haihua, Yang Dingyu, Zhu Xinghua, CrystEngComm . 2018,第29期

机译：氮氧比对DC磁控溅射制备的N掺杂TiO2薄膜的N原子位置的影响
3. Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering [J] . Zhang WJ, Zhu SL, Li Y, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2007,第3期

机译：直流反应磁控溅射制备光催化掺杂锌的TiO2薄膜
4. Effect of Ar/O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering [C] . Zhao Lin, Liping Lv, Jiawen Qiu International Nano-Optoelectronic Workshop; 20070729-0811; Beijing and Lanzhou(CN) . 2007

机译：Ar / O2气体流量比对直流磁控溅射制备的TiO2薄膜光催化效率的影响
5. The deposition and characterization of high dielectric constant films prepared by pulsed reactive DC magnetron sputtering technique. [D] . Kim, Jin-Young. 2000

机译：脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
6. High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency [O] . J Šícha, D Heřman, J Musil, 2007

机译：TiO2光催化薄膜的高速低温直流脉冲磁控溅射：重复频率的影响
7. Effect of substrate sodium content on crystallization and photocatalytic activity of TiO2 films prepared by DC magnetron sputtering [O] . Tomaszewski Henryk, Eufinger Karin, Poelman Hilde, 2007

机译：底物钠含量对直流磁控溅射制备TiO2薄膜结晶和光催化活性的影响

Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering

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