Printability study of reticle defects on wafer using Reticle Defect Review on E-beam review tools

机译：使用电子束检查工具上的掩模版缺陷检查，研究晶圆上掩模版缺陷的可印刷性

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In this paper we evaluate the Reticle Defect Review feature on KLA-Tencor's e-beam review tool, eDR™-7110, and study defect printability of reticle defects on wafer. The RDR feature is able to read KLA-Tencor's reticle inspection results directly without any intermediate format, thus allowing what-you-see-is-what-you-get setup on the wafer review tool. Compared with a conventional reticle to wafer approach using KLA Results Files, Reticle Defect Review provides faster time to results, more accurate defect disposition and increased ease of use, which have been demonstrated by the printability study of reticle defects on a focus exposure matrix wafer.

机译：在本文中，我们评估了KLA-Tencor的电子束检查工具eDR™-7110上的掩模版缺陷检查功能，并研究了掩模版缺陷在晶圆上的可印刷性。 RDR功能能够直接读取KLA-Tencor的掩模版检查结果，而无需任何中间格式，从而允许您在晶片查看工具上看到所见即所得的设置。与使用KLA结果文件的传统标线到晶片方法相比，“标线缺陷查看”提供更快的结果生成时间，更准确的缺陷位置和更高的易用性，这已通过对焦点曝光矩阵晶片上的标线缺陷进行可印性研究得到了证明。

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《Annual SEMI Advanced Semiconductor Manufacturing Conference》|2015年|351-355|共5页
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ChanSeob Cho; Taylor Ron; Mungmode Ashish; Dongsheng Fan; Spivak Dmitry; Camp Janay; Hong Xiao;
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R2W; defect printability; defect review; electron beam review; mask; reticle;

机译：R2W;缺陷可印刷性;缺陷检查;电子束检查;掩模;光罩;

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专利

1. Detection, Repair and Printability of Reticle Defects [J] . Khoi Phan, Christopher Spence, John Riddick, Semiconductor International . 2001,第10期

机译：十字线缺陷的检测，修复和可印刷性
2. Studying post-etching silicon crystal defects on 300mm wafers by automatic defect review AFM [J] . Zandiatashbar Ardavan, Taylor Patrick A., Kim Byong, Solid state technology . 2016,第3期

机译：通过自动缺陷审查AFM研究300mm晶片上的蚀刻后硅晶体缺陷
3. Characterizing wafer defects with an integrated AFM-DF review system [J] . Larry M. Ge, Monteith G. Heaton Micro . 2000,第2期

机译：集成的AFM-DF审查系统表征晶圆缺陷
4. Printability study of reticle defects on wafer using Reticle Defect Review on E-beam review tools [C] . ChanSeob Cho, Taylor Ron, Mungmode Ashish, Annual SEMI Advanced Semiconductor Manufacturing Conference . 2015

机译：晶圈综述工具丝网缺陷综述晶圆丝带缺陷的可印刷性研究
5. Local area mask patterning of extreme ultraviolet lithography reticles for native defect analysis [D] . Lyons, Adam 2013

机译：用于自然缺陷分析的极紫外光刻掩模版的局部掩模图案
6. Nasal Reconstruction of Post-Mohs Defects 1.5 cm in a Single Cosmetic Subunit Under Local Anesthesia by a Combination of Plastic Surgeon and Mohs Surgeon Team: A Cross-sectional Study and Review of Algorithmic Nasal Defect Closures [O] . Omeed M. Memar, Benjamin Caughlin 2019

机译：整形外科医生和Mohs外科医生团队的联合在局部麻醉条件下单个化妆品亚基中的Mohs缺陷 1.5 cm的鼻腔重建：横断面研究和算法性鼻腔闭合术的回顾
7. Simulation of Sub-Halfmicron Mask Defect Printability at 1X Reticle Magnification [O] . Warren W. Flack 1997

机译：亚半微米掩模缺陷在1X掩模版放大倍数下的可印刷性模拟

Printability study of reticle defects on wafer using Reticle Defect Review on E-beam review tools

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