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State of the art in focused ion-beam mask repair systems

机译：聚焦离子束掩模修复系统的最新技术

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Abstract: Focused ion beam (FIB) systems are commonly used to repair lithographic masks with features below one micron. We will summarize the development of focused ion beam mask repair systems starting from the original tools developed for photomasks approximately 10 years ago. The present state of the art in FIB mask repair systems is incorporated in two types of tools-one for repair of proximity print X-ray masks, and the other for repair of photomasks and some phase shift masks. Similarities of the two styles of systems include the gallium ion optics, the lithographic stage for accurate positioning, a thermal enclosure to minimize system drift, deflection and scanning electronics, and an interface to inspection data. The differences include the process chemistries, repair strategies, and imaging techniques. Examples of a variety of repaired defects on both X-ray and phase shift masks will be shown. Advanced masks such as those for EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet), and SCALPEL (Scattering with Angular Limitation in Projection Electron Lithography) will have to be repaired should those technologies mature, and presumably with FIB tools. Preliminary research and development of advanced mask repair problems will be described and possible approaches will be suggested.!17
机译：摘要：聚焦离子束（FIB）系统通常用于修复特征在1微米以下的光刻掩模。我们将从大约10年前为光掩模开发的原始工具开始，概述聚焦离子束掩模修复系统的开发。 FIB掩模修复系统中的当前技术水平被结合在两种类型的工具中，一种用于修复邻近印刷X射线掩模，另一种用于修复光掩模和某些相移掩模。两种系统的相似之处包括镓离子光学器件，用于精确定位的光刻台，用于最大程度地减少系统漂移，偏转和扫描电子器件的散热外壳以及用于检查数据的接口。差异包括工艺化学，修复策略和成像技术。将显示X射线和相移掩膜上各种修复缺陷的示例。如果这些技术成熟，可能必须使用FIB工具修复高级掩模，例如EUV（极紫外），DUV（深紫外）和SCALPEL（在投影电子光刻中具有角度限制的散射）。将描述高级面罩修复问题的初步研究和开发，并提出可能的方法。！17

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