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首页> 外文会议>International Conference on Materials for Renewable Energy and Environment >New nano-patterns generated by the self-assembling of PS spheres during ICP etching
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New nano-patterns generated by the self-assembling of PS spheres during ICP etching

机译：ICP蚀刻期间PS球体自组装产生的新纳米图案

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Polystyrene sphere is widely used as mask for wet-chemical or dry-plasma etching. During our inductively coupled plasma etching of silicon (100) surface to fabricate honeycomb structure, some self-assemble phenomena of the polystyrene sphere have appeared and new glam patterns have been observed under appropriate process. For the close-packed polystyrene spheres, a polystyrene membrane with highly ordered periodic regular triangle pores is obtained. And for the scattering polystyrene spheres, every polystyrene sphere have transformed to 3–5 “side-by-side goldfishes”. The affects of the flow of C4F8 on the patterns achieved have been investigated, and it is concluded that gas flow is a very important factor that affect the patterns generated by the self-assembling of the polystyrene spheres during etching process. The etching recipe reported here provides a technology to fabricate large area highly ordered polystyrene membranes with regular triangle or square pores. These membranes can be used as masks to fabricate triangular or square arrays of nano-pillars or nano-pores by wet-chemical or dry-plasma etching technologies.
机译：聚苯乙烯球被广泛地用作掩模的湿化学或干式等离子体蚀刻。在我们的感应耦合等离子体的硅（100）面的蚀刻来制造蜂窝结构体，所述聚苯乙烯球的一些自组装现象出现和新华丽模式已经在适当的过程观察。对于密堆积聚苯乙烯球，气孔获得具有高度有序的周期性正三角形聚苯乙烯膜。而对于散射聚苯乙烯球，每聚苯乙烯球都转化为3-5“并排侧金鱼”。 C4F8的上实现已经被研究的图案的流动的影响，并且得出的结论是气体流是影响由自组装的蚀刻工艺期间聚苯乙烯球所产生的图案的非常重要的因素。蚀刻配方这里报告提供了一个技术制作具有正三角形或正方形孔大面积高度有序的聚苯乙烯膜。通过湿化学或干式等离子体蚀刻技术，这些膜可用于作为掩模来制造三角形或正方形阵列的纳米柱或纳米孔。

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