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首页> 外文会议>Conference on Photomask and X-Ray Mask Technology >Repairing x-ray masks with Ta absorbers using focused ion beams
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Repairing x-ray masks with Ta absorbers using focused ion beams

机译：使用聚焦离子束使用TA吸收器修复X射线面罩

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A focus ion beam system was used to repair x-ray masks with Ta absorbers. To repair opaque defects, excess Ta is removed by ion milling. Since the wall of the milled pattern is tapered compared to the absorber patterns of the mask, milling parameters such as the ion dose are justified by printing the repaired pattern on the resist with the SR exposure system. Clear repairs are made with Ta deposited using a organometallic material. Since the Ta content of the deposit was about 30%, a Ta deposition layer thicker than 1.2-$mu@m is necessary to keep the contrast of the x-rays high. The repaired Ta absorber patterns have high chemical durability and are not damaged by wet cleaning with strong acid. We printed on resists with repaired masks and confirmed that the defects were completely repaired.
机译：聚焦离子束系统用于修复带TA吸收器的X射线面罩。为了修复不透明的缺陷，通过离子铣削除去过量的Ta。由于与掩模的吸收图案相比，铣削图案的壁是锥形的，因此通过用SR曝光系统印刷修复的图案，通过印刷修复的图案来证明诸如离子剂量的研磨参数。使用有机金属材料沉积的TA进行清晰的维修。由于沉积物的TA含量约为30％，因此为保持X射线的对比度高于1.2-口厚度小于1.2-口厚度。修复的TA吸收器图案具有高化学耐久性，并且不受强酸的湿法清洁损坏。我们印刷有抗蚀剂，修复的面具并确认缺陷完全修复。

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