Properties of DLC and a-C:N:H films grown by PECVD and MWCVD techniques

机译：通过PECVD和MWCVD技术生长的DLC和A-C的性质：N：H电影

获取原文

页面导航

摘要
著录项
相似文献
相关主题

摘要

Diamond-like carbon (DLC) and amorphous carbon-nitrogen-hydrogen (a-C:N:H) films have been deposited by Microwave Plasma Enhanced Chemical Vapour Deposition (MWCVD) at 2.45 GHz and by Plasma Enhanced CVD (PECVD). The layers, owing to high hardness and excellent corrosion resistance at elevated temperatures have found application in manufacturing of cutting tools and materials for nuclear reactors and in microelectronics. The materials were examined by means of FTIR, SEM, optical spectroscopy and X-ray diffractometry. The surface morphology, chemical composition, chemical bonding structure, optical and mechanical properties of films were investigated. The authors optimised the technological parameters of CVD processes to obtain high quality materials for future applications.

机译：已经通过微波等离子体增强的化学气相沉积（MWCVD）和血浆增强CVD（PECVD）沉积了金刚石碳（DLC）和无定形碳 - 氮气 - 氢气（A-C：N：H）膜。由于高温下的高硬度和优异的耐腐蚀性，这些层已发现在制造核反应堆和微电子中的切削工具和材料的应用。通过FTIR，SEM，光学光谱和X射线衍射法检测材料。研究了表面形态，化学成分，化学粘合结构，光学和力学性能。作者优化了CVD工艺的技术参数，以获得未来应用的高质量材料。

著录项

来源
《Minerals, Metals and Materials Society》|2000年||共9页
会议地点
作者
S. Jonas; T. Stapinski; E. Walasek;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类 TG174-532;
关键词

相似文献

外文文献
中文文献
专利

1. a-C:F:H films prepared by PECVD [J] . 刘雄飞, 肖剑荣, 简献忠, 中国有色金属学报（英文版） . 2004,第003期
2. Structural and mechanical properties of a-C:H and Si doped a-C:H thin films grown by LF-PECVD [J] . C. Chouquet, G. Gerbaud, M. Bardet, Surface & Coatings Technology . 2010,第9a10期

机译：通过LF-PECVD生长的a-C：H和掺Si的a-C：H薄膜的结构和力学性能
3. DLC Films Grown On Steel Using An Innovator Active Screen System For PECVD Technique [J] . Evaldo José Corat, Patrícia Cristiane Santana da Silva, Vladimir Jesus Trava-Airoldi, Materials Research . 2016,第4期

机译：使用用于PECVD技术的创新型主动屏系统在钢上生长DLC膜
4. An evaluation of the tribological characteristics of DLC films grown on Inconel Alloy 718 using the Active Screen Plasma technique in a Pulsed-DC PECVD system [J] . Ramirez Marco A. R., Silva Patricia C., Corat Evaldo J., Surface & Coatings Technology . 2015,第Null期

机译：在脉冲DC PECVD系统中使用有源屏等离子体技术评估在Inconel 718合金上生长的DLC膜的摩擦学特性
5. Properties of DLC and a-C:N:H films grown by PECVD and MWCVD techniques [C] . S. Jonas, T. Stapinski, E. Walasek Minerals, Metals and Materials Society . 2000

机译：通过PECVD和MWCVD技术生长的DLC和A-C的性质：N：H电影
6. A study of local atomic structure and thermal history in thermally grown and remote PECVD deposited silicon dioxide films. [D] . Fitch, Jon Taylor. 1990

机译：研究热生长和远端PECVD沉积的二氧化硅薄膜中的局部原子结构和热历史。
7. Effect of Low Concentration Sn Doping on Optical Properties of CdS Films Grown by CBD Technique [O] . Atefeh Jafari, Azmi Zakaria, Zahid Rizwan, 2011

机译：低浓度锡掺杂对CBD技术生长的CdS薄膜光学性能的影响
8. DLC Films Grown On Steel Using An Innovator Active Screen System For PECVD Technique [O] . Patrícia Cristiane Santana da Silva, Marco Antonio Ramirez Ramos, Evaldo José Corat, 2016

机译：DLC薄膜在钢上使用创新的技术进行了PECVD技术
9. Effect of aspect ratio and sp2/sp3 content on the field emission properties of carbon films grown by Ns-spiked PECVD [R] . Tong, W. , Felter, T. E. , Pan, L. S. , 1998

机译：长径比和sp2 / sp3含量对Ns掺杂pECVD生长碳膜场发射性能的影响

Properties of DLC and a-C:N:H films grown by PECVD and MWCVD techniques

摘要

著录项

相似文献

相关主题

期刊订阅