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Illumination pupil filtering using modified quadrupole apertures

机译：使用改进的四极孔孔的照明瞳孔过滤

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Off-axis illumination schemes have been developed that can enhance both the resolution and focal depth performance for an optical exposure tool. One approach introduced modifies the illumination profile, filling the condenser lens pupil with weak Gaussian quadrupoles where energy is distributed within and between poles. This method has demonstrated better control of DOF and proximity effect for a variety of feature types. Other possibilities also exist. Presented here are approaches to illumination modification through use of condenser lens masking apertures, fabricated as attenuating fused silica reticles which are inserted at the lens pupil plane. Application of this technique for use in high NA 248 nm and 193 nm exposure tools is shown. For each case, optimization of illumination profiles has been conducted. Optimized source files have been converted to halftone (dithered) masking files for electron beam patterning on fused silica with chromium and anti-reflective (AR) films. Analysis of these modified illumination techniques in terms of resolution, focal depth, throughput, and aberration performance is also presented.
机译：已经开发出轴轴照明方案，其可以增强光学曝光工具的分辨率和焦点深度性能。一种方法引入了照明轮廓，用弱高斯Quadrupoles填充冷凝器镜片瞳孔，其中能量分布在杆之间。该方法证明了对各种特征类型的DOF和邻近效果更好地控制。其他可能性也存在。这里介绍通过使用冷凝器透镜掩模孔来照明改性，作为衰减在镜片瞳平面上插入的熔融二氧化硅掩模。该技术在高Na 248nm和193nm曝光工具中使用这种技术的应用。对于每种情况，已经进行了照明轮廓的优化。优化的源文件已转换为具有铬和抗反射（AR）膜的熔融二氧化硅上的电子束图案化的半色调（抖动）掩蔽文件。还介绍了在分辨率，焦深，吞吐量和像差性能方面分析这些改进的照明技术。

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