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首页> 外文会议>Optical Microlithography XI >Illumination pupil filtering using modified quadrupole apertures
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Illumination pupil filtering using modified quadrupole apertures

机译：使用改良的四极子孔径的照明瞳孔滤波

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Abstract: Off-axis illumination schemes have been developed that can enhance both the resolution and focal depth performance for an optical exposure tool. One approach introduced modifies the illumination profile, filling the condenser lens pupil with weak Gaussian quadrupoles where energy is distributed within and between poles. This method has demonstrated better control of DOF and proximity effect for a variety of feature types. Other possibilities also exist. Presented here are approaches to illumination modification through use of condenser lens masking apertures, fabricated as attenuating fused silica reticles which are inserted at the lens pupil plane. Application of this technique for use in high NA 248 nm and 193 nm exposure tools is shown. For each case, optimization of illumination profiles has been conducted. Optimized source files have been converted to halftone (dithered) masking files for electron beam patterning on fused silica with chromium and anti-reflective (AR) films. Analysis of these modified illumination techniques in terms of resolution, focal depth, throughput, and aberration performance is also presented. !6
机译：摘要：已开发出轴外照明方案，可以提高光学曝光工具的分辨率和焦深性能。引入的一种方法可修改照明轮廓，使聚光透镜的瞳孔充满弱的高斯四极子，能量在两极之内和之间分布。对于多种要素类型，此方法已证明可以更好地控制自由度和接近效果。还存在其他可能性。这里介绍的是通过使用聚光镜掩膜孔来进行照明修改的方法，该聚光镜掩膜孔被制成为衰减的熔融石英掩模版，并插入在透镜光瞳平面处。显示了该技术在高NA 248 nm和193 nm曝光工具中的应用。对于每种情况，已经进行了照明分布的优化。已将优化的源文件转换为半色调（抖动）掩膜文件，以在带有铬和抗反射（AR）膜的熔融石英上对电子束进行构图。还介绍了这些改进的照明技术的分辨率，焦深，通过量和像差性能方面的分析。 ！6

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