This paper describes a new maskless micro-fabrication technique using the combination of nanometer-scale mechanical machining and wet etching. First, the (100) surface of a single-crystal silicon is machined by using the nano-machining system, which utilises the mechanism of the friction force microscope (FFM.) Next, the material is etched by KOH solution. After the etching process, the convex structure or deeper hole is made because of the masking or promotion effect of the affected layer generated by nano-machining. To investigate this interesting effect, the affected layer was analysed. Moreover, some test structures were fabricated by using the masking effect.
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