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New techniques for the measurement of x-ray beam or x-ray optics quality

机译:测量X射线束或X射线光学质量的新技术

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Metrology of XUV beams and more specifically X-ray laser (XRL) beam is of crucial importance for development of applications. We have then developed several new optical systems enabling to measure the x-ray laser optical properties. By use of a Michelson interferometer working as a Fourier-Transform spectrometer, the line shapes of different x-ray lasers have been measured with an unprecedented accuracy (δλ/λ~10~(-6)). Achievement of the first XUV wavefront sensor has enable to measure the beam quality of laser-pumped as well as discharge pumped x-ray lasers. Capillary discharge XRL has demonstrated a very good wavefront allowing to achieve intensity as high 3 * 10~(14) Wcm~(-2) by focusing with a f = 5 cm mirror. The measured sensor accuracy is as good as λ/120 at 13 nm. Commercial developments are under way.
机译:XUV梁的计量和更具体地X射线激光(XRL)光束对应用的发展至关重要。然后,我们开发了几种新的光学系统,使能测量X射线激光光学性能。通过使用作为傅立叶变换光谱仪的迈克尔逊干涉仪,已经以前所未有的精度测量不同X射线激光器的线形状(Δλ/λ〜10〜(-6))。第一XUV波前传感器的实现使能测量激光泵浦的光束质量以及放电泵浦X射线激光器。毛细管放电XRL已经证明了一种非常好的波线,允许通过聚焦F = 5cm镜子实现高3×10〜(14)WCM〜(-2)的强度。测量的传感器精度与13nm处的λ/ 120一样好。商业发展正在进行中。

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