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Investigation of thermophoretic protection with speed-controlled particles at 100 mTorr, 50 mTorr, and 25 mTorr - (PPT)

机译:100 mtorr,50 mtorr和25 mtorr - (PPT)的速度控制颗粒对蒸汽保护的研究

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摘要

Particle contamination control is crucial for protecting Extreme Ultraviolet Lithography (EUVL) masks in manufacturing tools. Due to the small feature sizes, particles with diameters down to 30 nm can deteriorate the mask performance. Therefore control schemes are required to protect the mask from particle deposition during applications in EUVL exposure tools at reduced pressure. A non-contact method for protection of EUVL mask, like thermophorcsis, is most desirable.
机译:粒子污染控制对于保护制造工具中的极端紫外线(EUVL)面罩是至关重要的。由于小特征尺寸,直径至30nm直径的颗粒可以恶化掩模性能。因此,在EUVL曝光工具在减压下,需要控制方案以保护掩模免受粒子沉积免受粒子沉积。用于保护Euvl面膜的非接触方法,如热托洛斯,是最理想的。

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