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Hetero-epitaxial growth of ZnO thin films on sapphire (1120) substrate by means of AP-HVPE

机译:通过AP-HVPE通过AP-HVPE在蓝宝石(1120)衬底上的ZnO薄膜的杂外延生长

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Zinc oxide (ZnO) is a semiconductor with a large band-gap of 3.4 eV and a large excitonic binding energy of 60 meV,making it a potential candidate for UV-light-emitting/detecting devices with high quantum efficiency.In a previous paper,we reported that high-quality ZnO epitaxial layers can be grown successfully on a sapphire (0001) substrate by atmospheric pressure halide vapor phase epitaxy (AP-HVPE).In this work,reports the results of an investigation into ZnO thin films on a sapphire (1120) substrate prepared by AP-HVPE.
机译:氧化锌(ZnO)是具有3.4eV的大带间隙的半导体,并且具有60meV的大的激子结合能,使其成为具有高量子效率的UV发光/检测装置的潜在候选。在前一篇论文中我们报道,通过大气压卤化物气相外延(AP-HVPE),可以在蓝宝石(0001)衬底上成功生长高质量的ZnO外延层。在这项工作中,将调查调查的结果报告为A上的ZnO薄膜蓝宝石(1120)底物由AP-HVPE制备。

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