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ELECTRICAL CHARACTERIZATION AND DIELECTRIC RELAXATION OF AU/POROUS SILICON CONTACTS

机译:Au /多孔硅触头的电学特性和介电弛豫

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The DC and AC electrical characterization of Au/porous silicon contacts in room temperature is presented. The Porous Silicon layers were prepared by electrochemical etching in p-type silicon <100> substrates. The DC resistances were studied and the AC electrical measurements were performed from 5 Hz to 10 MHz, for the four samples at 0V. We found two behaviours typical of the dielectric permittivity property of samples studied; i) the regimen of strong dispersion present at low frequency and ii) the relaxation region that dominates at high frequency. An electrical equivalent circuit was proposed to fit the experimental frequency response of the different samples. We have obtained various model parameter values fitting corresponding Au/PS structures fabricated under different process conditions.
机译:提出了室温中Au /多孔硅触头的DC和AC电气表征。通过在p型硅<100粒子中通过电化学蚀刻制备多孔硅层。研究了直流电阻,并在0V时为四个样品从5Hz至10MHz进行AC电测量。我们发现研究了样品的介电介电常数的典型行为; i)在低频和II)处存在强大的分散体的方案,II)在高频下占主导地位的松弛区域。提出了一种电力等效电路以适合不同样品的实验频率响应。我们已经获得了在不同工艺条件下制造的相应AU / PS结构的各种型号参数值。

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