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Effect of Working Distance on Properties of Sputtered Molybdenum Films

机译:工作距离对溅射钼膜性能的影响

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Molybdenum back contact deposition is a bottleneck in high volume manufacturing due to the current state of art where multi layer molybdenum film needs to be deposited to achieve the required properties. In order to understand and solve this problem experiments were carried out. The effect of working distance (distance between the target and the substrate) on film properties was studied and is presented in this work. Earlier work carried out at Florida Solar Energy Center reflected on the effect of the sputtering power and working gas pressure on the film properties. This work is continuation of that effort in understanding effects of various sputtering parameters and determining the possible route to develop single layer molybdenum films with the required properties of near zero stress, low resistivity and good adhesion to substrate.
机译:由于需要沉积多层钼膜以达到所需性质,钼背面接触沉积是高批量制造中的瓶颈,以达到所需的性能。为了理解和解决这个问题进行实验。研究了工作距离(目标和底物之间的距离)对膜性能的影响,并在这项工作中提出。在佛罗里达太阳能中心开展的早期工作反映在溅射功率和工作气体压力对薄膜性质的影响。这项工作是在理解各种溅射参数的效果和确定可能的途径以使单层钼薄膜的可能性具有接近零应力,低电阻率和良好粘附的底物的途径继续进行努力。

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