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An alignment method for lift-off on shallow grooves in transparent substrates for integrated dual grating structures

机译：用于集成双光栅结构的透明基板中浅槽上浅槽剥离的对准方法

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摘要

In this paper, we propose an alignment method for lift-off on shallow grooves in transparent substrates without an extra mask for integrated dual grating structures. An assistant metal layer was deposited on the glass substrate with grooves to increase the reflectance, and then a layer of photoresist for lift-off process was coated and patterned aligning with the shallow grooves. Experimental results showed that an aluminum or chromium film with the thickness larger than 10nm provides high enough image contrast of profile of the alignment marks beneath the photoresist. The image contrast of contour profile of the marks was enhanced as the thickness increased. Lift-off process was then implemented on the assistant reflecting layer. With a 20nm Cr layer, we successfully did lithography and finished the lift-off process to pattern a Cr/Au layer on shallow grooves in a glass wafer. Then the assistant Cr layer was removed using dry etching. Finally, integrated dual grating structures were fabricated. The assistant metal layer has no undesirable influence on the following process and the device property.
机译：在本文中，我们提出一种用于剥离在透明基板的浅槽的对准方法，无需为集成双光栅结构一个额外掩模。助理金属层被沉积​​在玻璃基板上具有凹槽，以增加反射率，然后光致抗蚀剂层对剥离工艺涂覆并图案化对准与所述浅槽。实验结果表明，铝或铬膜与厚度小于10nm大提供光致抗蚀剂下方的对准标记的配置文件的足够高的图像对比度。标记的外形轮廓的图像对比度得到加强，因为厚度增加。然后剥离工艺对所助理反射层实现。用20nm的Cr层，我们成功地做了光刻和在玻璃晶片完成了剥离工艺来图案化上浅槽的Cr / Au层。然后使用干蚀刻除去助理Cr层。最后，集成双光栅结构进行制造。辅助金属层具有以下过程和设备特性没有不利影响。

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