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Electroless Displacement Deposition of Nanocrystalline Al on Mg Surface from AlCl3-EMIC Ionic Liquid

机译：AlCl3-EMIC离子液体纳米晶体纳米晶Al的化学沉积沉积

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In this paper, electroless displacement deposition of Al on Mg surface in AlCl3-1-ethyl-3-methyl-imidazolium chloride (AlCl3-EMIC) ionic liquid was reported. The electrolytic etching pretreatment of Mg substrate was employed to remove the oxide layers on the surface. The process of displacement deposition was studied by open-circuit potential (OCP) measurement. The electroless deposited Al on Mg was characterized by grazing incidence X-ray diffraction (GIXRD) and scanning electron microscope (SEM). The results showed that for the Mg substrate with oxide layer on the surface, microcrystalline Al crystals of 10-20 μm were obtained in the way of immersing the Mg directly in the ionic liquid. But for the Mg substrate with oxide layer removed, the deposited Al crystals by placing the Mg in the ionic liquid were nanocrystalline, while Al particles of 200-300 nm were deposited by placing the substrate in the glove-box with residual ionic liquid on the surface.
机译：本文报道了Al 3-1-乙基-3-甲基 - 咪唑氯化物（ALCL3-EMIC）离子液体中的Mg表面对Mg表面的化学置换沉积。使用Mg衬底的电解蚀刻预处理以除去表面上的氧化物层。通过开路电位（OCP）测量研究了位移沉积过程。通过放牧入射X射线衍射（GixRd）和扫描电子显微镜（SEM），表征Mg上的化学镀Al。结果表明，对于表面上的氧化物层的Mg衬底，以10-20μm的微晶Al晶体以浸入离子液体中的浸入Mg的方式获得。但是对于除去具有氧化物层的Mg衬底，通过将Mg放入离子液体中的沉积的Al晶体是纳米晶体，而通过将基材放置在手套箱中，在具有残留的离子液体的手套箱中沉积200-300nm的Al粒子表面。

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