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Determination of Limiting Current Density of a Solution with Copper, Zinc and EDTA from the Effluent of Brass Electrodeposition

机译:黄铜电沉积流出物中铜,锌和EDTA溶液限制电流密度的测定

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In the last decades, authors have been focused in the development of a cyanide-free bath for the electroplating industry of brass due to the risks that involves the use of cyanide and they have been evaluated the electrodialysis as an alternative method for the treatment of the effluent generated in this type of industry because of the limitations caused by the chemical precipitation. Hence, the present paper aimed to determine the limiting current density of the effluent generated in the free-cyanide electrodeposition of copper and zinc using EDTA as chelating agent for the treatment of the effluent by electrodialysis. The synthesized solutions were prepared with copper sulfate and zinc sulfate in different conditions of pH (10-12) and proportion of cupric ions (30%, 50%, 70%). According to the results, the increase of pH and the cupric ions proportion caused an increase in the limiting current density because of the larger amount of anionic species in solution and the consequent difficult to achieve the concentration polarization phenomenon.
机译:在过去的几十年中,由于涉及使用氰化物的风险,作者们一直专注于黄铜电镀行业的氰化物浴室的开发,并且他们已经评估了电渗析作为治疗的替代方法由于化学沉淀引起的局限性,这种行业产生的流出物。因此,本文旨在确定铜和锌自由氰基电沉积在铜和锌中产生的流出物的限制电流密度,用EDTA作为电渗析处理流出物的螯合剂。用硫酸铜和硫酸锌在不同的pH(10-12)条件下制备合成溶液,铜离子比例(30%,50%,70%)。根据结果​​,pH值的增加与铜离子比例引起因为阴离子物质在溶液中的更大的量和随之而来的难以达到的浓差极化现象的极限电流密度的增加。

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