首页> 外文会议>Symposium S, "Nanostructured Metal Oxides for Advanced Applications" >Effect of Silver thickness and Annealing on Optical and Electrical Properties of Nb_2O_5/Ag/Nb_2O_5 Multilayers as Transparent Composite Electrode on Flexible Substrate
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Effect of Silver thickness and Annealing on Optical and Electrical Properties of Nb_2O_5/Ag/Nb_2O_5 Multilayers as Transparent Composite Electrode on Flexible Substrate

机译:银厚度与退火对Nb_2O_5 / Ag / Nb_2O_5多层的光学和电性能的影响柔性基板上的透明复合电极

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Multilayer structures of Nb_2O_5/Ag/Nb_2O_5 have been deposited onto flexible substrates by sputtering at room temperature to develop indium free composite transparent conductive electrodes. The optical and electrical properties of the multilayers are measured by UV-Visible spectroscopy, Hall measurement and four point probe and the effect of Ag thickness has been studied. The critical thickness of Ag to form a continuous conducting layer is found to be 9.5 nm and the multilayer stack has been optimized to obtain a sheet resistance of 7.2 Ω/sq and an average optical transmittance of 86% at 550 nm. The Haacke figure of merit (FOM) has been calculated for the films, and the multilayer with 9.5 nm thick Ag layer has the highest FOM with 31.5 × 10~(-3) Ω/sq, which is one of the best FOM reported till date for room temperature deposition on flexible substrates. The multilayered samples are annealed in vacuum, forming gas, air and O_2 environments and the optical and electrical properties are compared against the as-deposited samples.
机译:Nb_2O_5 / Ag / Nb_2O_5的多层结构通过在室温下溅射沉积在柔性基板上,以开发铟复合透明导电电极。多层的光学和电性能通过UV可见光光谱测量,霍尔测量和四点探针,并研究了Ag厚度的效果。发现AG以形成连续导电层的临界厚度为9.5nm,并且已经优化了多层叠层以获得7.2Ω/ sq的薄层电阻,并且在550nm处的平均光透射率为86%。已经为薄膜计算了MERIT(FOM)的哈卡科,并且具有9.5nm厚AG层的多层具有31.5×10〜(-3)Ω/平方米的最高FOM,这是最佳复杂的FOM之一柔性基板上的室温沉积日期。多层样品在真空中退火,形成气体,空气和O_2环境,并将光学和电性能与沉积的样品进行比较。

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