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首页> 外文会议>Conference on Metrology, Inspection, and Process Control for Microlithography >An In-line Image Quality Monitoring System for Imaging Device Fabrication using Automated Macro-Inspection
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An In-line Image Quality Monitoring System for Imaging Device Fabrication using Automated Macro-Inspection

机译：用于使用自动宏观检查的成像装置制造的在线图像质量监测系统

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An in-line image quality monitoring system using automated macro-inspection is described. One of the critical problems in reducing yield in CCD manufacture is the production of mura, regions of uneven sensitivity in the device. In this paper, an in-line mura-related yield monitor is presented using the recently developed Tokyo Aircraft Instrument Company EDIS-3000 Automated Macro-Inspection system, which has a high sensitivity and a high resolution optical module developed by IBM™ Japan. The optical module is designed to focus on reflected light from the pattern edge, not on the traditional diffracted light, so it is expected to register the linearity between the wafer CD and the wafer image. This system is expected to reduce yield loss, resulting in a faster time-to-market for imaging devices.
机译：描述了一种使用自动宏检查的在线图像质量监测系统。降低CCD制造中产量的关键问题之一是尤拉的生产，在装置中不均匀的敏感区。本文采用最近开发的东京飞机仪表公司EDIS-3000自动宏观检查系统，提供了一条内村相关产量监测器，其具有高灵敏度和由IBM™日本开发的高分辨率光学模块。光学模块设计用于从图案边缘的反射光聚焦，而不是传统的衍射光，因此预期在晶片CD和晶片图像之间注册线性度。该系统预计将降低产量损失，导致成像设备更快的上市时间。

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