Piezoresistive sensitivity and Al ohmic contact of highly doped polycrystalline silicon nano thin films

著录项

• 来源
  《International Conference of Chinese Society of Micro-Nano Technology;Annual Conference of the Chinese Society of Micro-Nano Technology》|2010年|p.789-793|共5页
• 会议地点 Xian(CN);Xian(CN)
• 作者

  ChangzhiShi; Xiaowei Liu; XuanWu; Haitao Zheng;

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• 作者单位

  MEMS Center, Harbin Institute of Technology, Harbin, Heilongjiang Province, CHINA,Key Laboratory of Micro-Systems and Micro-Structures Manufacturing of Ministry of Education, Harbin Institute of Technology, Harbin, Heilongjiang Province, CHINA;

  MEMS Center, Harbin Institute of Technology, Harbin, Heilongjiang Province, CHINA,Key Laboratory of Micro-Systems and Micro-Structures Manufacturing of Ministry of Education, Harbin Institute of Technology, Harbin, Heilongjiang Province, CHINA;

  MEMS Center, Harbin Institute of Technology, Harbin, Heilongjiang Province, CHINA;

  MEMS Center, Harbin Institute of Technology, Harbin, Heilongjiang Province, CHINA;

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• 会议组织
• 原文格式 PDF
• 正文语种 eng
• 中图分类 光学仪器;微电子学、集成电路（IC）;
• 关键词

  polycrystalline silicon; nano thin film; piezoresistive sensitivity; gauge factor; ohmic contact;

  机译：多晶硅纳米薄膜压阻灵敏度；规格因子;欧姆接触;