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The Role of the Source and Drain Contacts on Self-Heating Effect in Nanowire Transistors

机译:源极和漏极触点对纳米线晶体管自热效应的作用

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We find that self-heating effects are not pronounced in silicon nanowire transistors with channel length 10 nm even in the presence of the wrap-around oxide. We observe a maximum current degradation of 6% for V_g=V_d=1.0 V in a structure in which the metal gates are far away from the channel. The overall small current degradation is attributed to the significant velocity overshoot effect in these structures. The lattice temperature profile shows moderate temperature rise and velocity of the carriers is slightly deteriorated due to self-heating effects when compared to isothermal simulations.
机译:我们发现,即使在存在环绕氧化物的情况下,在沟道长度为10 nm的硅纳米线晶体管中,自热效应也不明显。我们观察到在金属栅极远离沟道的结构中,对于V_g = V_d = 1.0 V,最大电流衰减为6%。总体上较小的电流衰减归因于这些结构中明显的速度过冲效应。与等温模拟相比,晶格温度曲线显示出适度的温度上升,并且由于自热效应,载流子的速度略有下降。

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