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首页> 外文会议>Microelectronics technology and devices - SBMicro 2011 >Process Modeling and Fabrication of Microlens Array in Thick Photoresist
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Process Modeling and Fabrication of Microlens Array in Thick Photoresist

机译：厚光刻胶中微透镜阵列的工艺建模和制作

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摘要

In this work, the design and fabrication of a low f-number cylindrical microlens array is presented. The lenses were fabricated in thick photo resist of 12 μm thickness, using a contact printer exposure through a mask with a repetitive 6μm line-4 μm space pattern. Numerical calculations based on scalar diffraction theory were employed to model the light propagation inside the resist, determining the aerial image as a function of its thickness. Than the resist response characteristics, expressed by its contrast curve, and absorption rate were used to obtain a cross section profile. A good match between numerical and experimental results were found.
机译：在这项工作中，介绍了低f数柱面微透镜阵列的设计和制造。使用接触式打印机通过具有重复6μm线-4μm间隔图案的掩模进行曝光，以12μm厚的厚光刻胶制造透镜。采用基于标量衍射理论的数值计算来对光在抗蚀剂内部的传播进行建模，从而确定航空影像与厚度的关系。用由其对比曲线表示的抗蚀剂响应特性和吸收率来获得横截面轮廓。发现数值和实验结果之间的良好匹配。

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