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Microstereolithography production of integrated Hadamard mask structures

机译：集成Hadamard掩模结构的微立体光刻生产

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The use of modern microstreolithography (MSL) technology gives optics developers the freedom to integrate mounting and positioning structures directly into an optical mask structure. We have created Hadamard spectrometer masks with increments of 150 μm and less using the Sony SCS-6000 microstereolithography apparatus (MSLA). Due to laser over cure and other parameters, adjustments were made iteration by iteration until appropriate mask tolerances were met. A mounting structure was integrated with the mask for testing and application. At the computer aided design (CAD) model level, the mounting geometry can be adjusted to fit any specific mounting apparatus. By using the MSLA, features as small as 75 μm and larger than 300 mm can be created in the same build. Additionally, the conceptual design of an entire positioning system constructed using layer additive MSLA microfabrication is underway. This positioning system may be built as an integrated assembly, encapsulating necessary components. Optical characterization results are presented.
机译：现代微结构光刻（MSL）技术的使用使光学开发人员可以自由地将安装和定位结构直接集成到光学掩模结构中。我们已经使用Sony SCS-6000微立体光刻设备（MSLA）创建了150微米或更小的增量的哈达玛光谱仪掩模。由于激光过度固化和其他参数的影响，每次迭代都要进行调整，直到达到合适的掩模公差为止。安装结构与掩模集成在一起，用于测试和应用。在计算机辅助设计（CAD）模型级别，可以调整安装几何形状以适合任何特定的安装设备。通过使用MSLA，可以在同一版本中创建小至75μm和大于300 mm的特征。另外，正在使用层加法MSLA微加工构造的整个定位系统的概念设计。该定位系统可以构建为集成组件，封装必要的组件。给出了光学表征结果。

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