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Microstereolithography production of integrated Hadamard mask structures

机译：MicrostereRestographics生产集成的Hadamard掩模结构

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The use of modern microstreolithography (MSL) technology gives optics developers the freedom to integrate mounting and positioning structures directly into an optical mask structure. We have created Hadamard spectrometer masks with increments of 150 μm and less using the Sony SCS-6000 microstereolithography apparatus (MSLA). Due to laser over cure and other parameters, adjustments were made iteration by iteration until appropriate mask tolerances were met. A mounting structure was integrated with the mask for testing and application. At the computer aided design (CAD) model level, the mounting geometry can be adjusted to fit any specific mounting apparatus. By using the MSLA, features as small as 75 μm and larger than 300 mm can be created in the same build. Additionally, the conceptual design of an entire positioning system constructed using layer additive MSLA microfabrication is underway. This positioning system may be built as an integrated assembly, encapsulating necessary components. Optical characterization results are presented.
机译：现代微信标（MSL）技术的使用为光学开发人员提供了将安装和定位结构直接集成到光学掩模结构中的自由度。我们使用索尼SCS-6000微型光刻设备（MSLA）产生了具有150μm的增量和更少的增量的Hadamard光谱仪掩模。由于激光对固化和其他参数，通过迭代进行调整，直到满足适当的掩模公差。安装结构与用于测试和应用的掩模集成。在计算机辅助设计（CAD）模型电平，可以调整安装几何体以适合任何特定的安装设备。通过使用MSLA，可以在相同的构建中创建小至75μm和大于300 mm的功能。另外，正在进行使用层添加剂MSLA微制造构造的整个定位系统的概念设计。该定位系统可以作为集成组件构建，封装必要的组件。提出了光学表征结果。

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