Investigation of the Ⅲ-Ⅴ Oxidation Process for the Fabrication of Sub-Micron Three Dimensional Photonic Devices

机译：制备亚微米三维光子器件的Ⅲ-Ⅴ氧化工艺研究

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The lateral oxidation of epitaxially grown Al_xGa_(1-x)As layers is investigated in an open-chamber system based on a conventional horizontal tube furnace, and in a closed-chamber system. The oxidation is selective and depends on the Al content, process temperature, and process time. The process is characterized as a function of these parameters. The closed chamber system provides faster oxidation with superior control, repeatability and uniformity of the oxidation extent as compared to the open-chamber system. Based on these investigations of the oxidation reaction, we propose a unique method for realizing 3D photonic crystals in GaAs/AlGaAs-based material.

机译：在基于常规水平管式炉的开室系统和闭室系统中研究了外延生长的Al_xGa_（1-x）As层的横向氧化。氧化是选择性的，并且取决于Al含量，工艺温度和工艺时间。该过程的特征是这些参数的函数。与开放腔室系统相比，封闭腔室系统提供了更快的氧化速度，具有出色的控制性，可重复性和氧化程度的均匀性。基于对氧化反应的研究，我们提出了一种在GaAs / AlGaAs基材料中实现3D光子晶体的独特方法。

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来源
《Micromachining Technology for Micro-Optics and Nano-Optics IV》|2006年|P.61100P.1-61100P.8|共8页
会议地点 San JoseCA(US)
作者
Kierthi Swaminathan; Janusz Murakowski; Chris Schuetz; Garrett J. Schneider; Bhargav S. Citla; Dennis W. Prather;
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作者单位

Electrical Computer Engineering, University of Delaware, Newark, DE 19716;

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会议组织
原文格式 PDF
正文语种 eng
中图分类半导体技术;设计;
关键词
Ⅲ-Ⅴ oxidation; 3D photonic crystals; ICP etching; optoelectronic devices;

机译：Ⅲ-Ⅴ氧化； 3D光子晶体； ICP刻蚀；光电器件;

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机译：X射线光刻中用于制造亚微米特征尺寸器件的工艺条件
2. Process conditions in X-ray lithography for the fabrication of devices with sub-micron feature sizes [J] . Timo Mappes, Sven Achenbach, Juergen Mohr Microsystem technologies . 2007,第3a4期

机译：X射线光刻中用于制造亚微米特征尺寸器件的工艺条件
3. Centrifugation and spin-coating method for fabrication of three-dimensional opal and inverse-opal structures as photonic crystal devices [J] . YanXu, Garrett J. Schneider, Eric D. Wetzel, Journal of Microlithography, Microfabrication, and Microsystems. (JM3) . 2004,第1期

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4. Investigation of the Ⅲ-Ⅴ Oxidation Process for the Fabrication of Sub-Micron Three Dimensional Photonic Devices [C] . Kierthi Swaminathan, Janusz Murakowski, Chris Schuetz, Conference on Micromachining Technology for Micro-Optics and Nano-Optics . 2006

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5. Fabrication of two-dimensional and three-dimensional photonic crystal devices for applications in chip-scale optical interconnects. [D] . Venkataraman, Sriram. 2006

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6. Sub-Micron Particle Based Structures as Reconfigurable Photonic Devices Controllable by External Photonic and Magnetic Fields [O] . Asaf Shahmoon, Amihai Meiri, Zeev Zalevsky 2011

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7. Design and fabrication of one-dimensional and two-dimensional photonic bandgap devices [O] . Lim Kuo-Yi 1969- 1999

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Investigation of the Ⅲ-Ⅴ Oxidation Process for the Fabrication of Sub-Micron Three Dimensional Photonic Devices

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