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Investigation of Se Ion Implantation for gaAs very High Speed Gate Array

机译:砷化镓超高速门阵列的离子注入研究

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Se~+-implanted GaAs substrates were performed at room temperature, we investigated the effects of incident energy, the ion dose and the incident angle. The rapid thermal annealing (RTA) temperature and the duration time as well All these parameter were optimized. Using Se~+-implantation at the dose of 1 x 10~13cm~-2, we got the n~+- type thin layers on GaAs substrates. The carrier mobility was 3010cm~2/v.s, and the impurity activity is greater than 74
机译:硒离子注入GaAs衬底在室温下进行,我们研究了入射能量,离子剂量和入射角的影响。快速热退火(RTA)温度和持续时间以及所有这些参数均已优化。通过以1 x 10〜13cm〜-2的剂量注入Se〜+,在GaAs衬底上获得了n〜+-型薄层。载流子迁移率为3010cm〜2 / v.s,杂质活度大于74

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