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ULTRA-SMOOTH ZnO BUFFER LAYERS ON (001) SAPPHIRE

机译:(001)蓝宝石上的超光滑ZnO缓冲层

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摘要

Using off-axis reactive rf sputtering, we have grown extremely smooth, nearly epitaxial, (001) oriented ZnO films on c-axis sapphire substrates. Atomic Force Microscopy was used to determine that these films are extremely smooth, having an rms roughness of only a few tenths of a nanometer. Based on high resolution x-ray diffraction (HXRD), the ZnO is highly oriented, with a rocking curve width of less than 400 arc seconds for the (006) diffraction peak, and only somewhat larger for the (112) reflection. HXRD Phi scans show that the ZnO (112) reflection is rotated in the a-b plane by 30 degrees from the sapphire (113) direction. These two measurements indicate excellent in-plane orientation. We are investigating the use of these buffer layers for subsequent GaN growth. Electrical resistivities of the films exceeded 100 kΩ-cm making ZnO a potential candidate as an insulating buffer layer.
机译:使用离轴反应射频溅射,我们在c轴蓝宝石衬底上生长了非常光滑,近乎外延的(001)取向的ZnO膜。原子力显微镜用于确定这些薄膜非常光滑,均方根粗糙度仅为十分之几纳米。基于高分辨率X射线衍射(HXRD),ZnO具有高度取向,对于(006)衍射峰,其摇摆曲线宽度小于400弧秒,而对于(112)反射,其摇摆曲线宽度仅稍大。 HXRD Phi扫描显示ZnO(112)反射在a-b平面中从蓝宝石(113)方向旋转了30度。这两个测量值表明极好的面内定向。我们正在研究将这些缓冲层用于随后的GaN生长。薄膜的电阻率超过100kΩ-cm,使得ZnO可以作为绝缘缓冲层。

著录项

  • 来源
    《Nitride semiconductors》|1997年|289-294|共6页
  • 会议地点 Boston MA(US)
  • 作者单位

    Air Force Research Laboratory, AFRL/SNHX, 80 Scott Dr., Hanscom AFB, MA 01731;

    National Research Council Research Associate;

    Air Force Research Laboratory, AFRL/SNHX, 80 Scott Dr., Hanscom AFB, MA 01731;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
  • 关键词

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