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LOCALIZED DONORS IN GaN: SPECTROSCOPY USING LARGE PRESSURES

机译:GaN中的局部供体:使用大压力的光谱

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摘要

Properties of GaN and its alloys are strongly controlled by impurities and strain. Using large hydrostatic and biaxial pressure we identify the role of donor dopants and stress induced fields. The doping of Si and O as relevant representatives of group-IV and group-VI impurities are studied in Raman spectroscopy. For pressures above 20 GPa we find that oxygen induces a strongly localized gap state while Si continues to behave as a hydrogenic donor. Such a DX-like behavior of O indicates and corresponds to doping limitations in AlGaN alloys. The site specific (O_N, Si_(Ga)) formation of a gap-state is attributed to bond strengths of the respective neighbors. In photoreflection of pseudomorphic GalnN we observe pronounced Franz-Keldysh oscillations corresponding to piezoelectric fields of 0.6 MV/cm. An observed redshift of the luminescence is found to originate in electric field induced tailstates. A reduced but similar effect is expected for GaN possibly explaining observations of persistent photoconductivity in a wide range of materials.
机译:GaN及其合金的性能受到杂质和应变的强烈控制。使用较大的静水压力和双轴压力,我们确定了施主掺杂剂和应力感应场的作用。在拉曼光谱中研究了作为IV族和VI族杂质的相关代表的Si和O的掺杂。对于高于20 GPa的压力,我们发现氧气会诱导强烈的局部间隙态,而Si继续充当氢供体。 O的这种类似DX的行为表明并对应于AlGaN合金中的掺杂限制。间隙状态的位点特异性(O_N,Si_(Ga))的形成归因于各个邻居的结合强度。在准晶GalnN的光反射中,我们观察到明显的Franz-Keldysh振荡,对应于0.6 MV / cm的压电场。发现观察到的发光的红移起源于电场引起的尾态。预计GaN会产生减少但相似的影响,这可能解释了在多种材料中存在持久光电导性的现象。

著录项

  • 来源
    《Nitride semiconductors》|1997年|489-500|共12页
  • 会议地点 Boston MA(US)
  • 作者单位

    High Tech Research Center, Meijo University, Tempaku-ku, 468 Nagoya, Japan Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;

    High Tech Research Center, Meijo University, Tempaku-ku, 468 Nagoya, Japan;

    High Tech Research Center, Meijo University, Tempaku-ku, 468 Nagoya, Japan;

    High Pressure Research Center, Warsaw, Poland;

    Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;

    Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;

    1. Physics Institute, Justus-Liebig-University Gi;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
  • 关键词

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