High Tech Research Center, Meijo University, Tempaku-ku, 468 Nagoya, Japan Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;
High Tech Research Center, Meijo University, Tempaku-ku, 468 Nagoya, Japan;
High Tech Research Center, Meijo University, Tempaku-ku, 468 Nagoya, Japan;
High Pressure Research Center, Warsaw, Poland;
Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;
Materials Science Division, Lawrence Berkeley National Laboratory and University of California, Berkeley, CA 94720, USA;
1. Physics Institute, Justus-Liebig-University Gi;
机译:通过电反射光谱研究栅金属引起的GaN / AlGaN / GaN异质结构中表面施主密度的降低
机译:通过电反射光谱研究栅金属引起的GaN / AlGaN / GaN异质结构中表面施主密度的降低
机译:GaN中基础堆积缺陷附近施主的电子定位
机译:GaN中的局部供体:使用大压力的光谱
机译:跨剖面AlGaN / GaN设备中陷阱的扫描探针光谱
机译:关于碳掺杂GaN中供体/受体补偿比的建模在横向GaN功率Hemts中的单一再现击穿电压和电流塌陷
机译:GaN中的局部供体:使用大压力的光谱
机译:在大型静水压力下的供体光谱和化合物半导体中的传输研究