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PULSED OPERATION OF CLEAVED-FACET InGaN LASER DIODES

机译:切割面InGaN激光二极管的脉冲操作

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摘要

Blue-emitting nitride laser diodes have been fabricated on a-plane sapphire (1120). The active region is composed of 10 In_(0.18)Ga_(82)N quantum wells, which were grown by MOCVD at atmospheric and low pressure in a modified two-flow Thomas-Swan Ltd. horizontal reactor. The chemical precursors used were trimethylgallium (TMGa), trimethylindium (TMIn), trimethylaluminum (TMA1), ammonia, and disilane. The n- and p-contacts were formed by depositing Ti/Al/Ni/Au and Ni/Au/Ni/Au, respectively. Diode wafers were thinned to less than 50 μm before they were cleaved along the sapphire r-plane (1102).rnLasers show TE polarization, spectral line narrowing, and far field interference patterns above the lasing threshold. The laser emission spectra peak at 410-420 nm. Under pulsed operation at room temperature, the lowest observed threshold current density was 15 kA/cm~2 with threshold voltages ranging from 50-90 V. Differential efficiencies are as high as 7% with maximum output powers greater than 50 mW. Near and far field mode patterns are presented. Structures are gAlN-guided devices with each device occupying a mesa with a width of 125 μm. Device widths range from 3 to 20 μm, with lengths of 500 to 1200 μm.
机译:已在a面蓝宝石(1120)上制造了发射蓝光的氮化物激光二极管。活性区域由10个In_(0.18)Ga_(82)N量子阱组成,这些量子阱通过MOCVD在常压和低压下在改良的双流Thomas-Swan Ltd.水平反应器中生长。所使用的化学前体是三甲基镓(TMGa),三甲基铟(TMIn),三甲基铝(TMA1),氨和乙硅烷。通过分别沉积Ti / Al / Ni / Au和Ni / Au / Ni / Au形成n和p接触。沿蓝宝石r平面劈开之前,将二极管晶圆减薄至小于50μm(1102)。激光显示TE极化,光谱线变窄以及远场干涉图案高于激光阈值。激光发射光谱在410-420 nm处达到峰值。在室温下脉冲操作下,观察到的最低阈值电流密度为15 kA / cm〜2,阈值电压范围为50-90V。差分效率高达7%,最大输出功率大于50 mW。呈现了近场模式和远场模式。结构是由gAlN引导的设备,每个设备占据一个台面,宽度为125μm。器件宽度为3至20μm,长度为500至1200μm。

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  • 来源
    《Nitride semiconductors》|1997年|1197-1202|共6页
  • 会议地点 Boston MA(US)
  • 作者单位

    ECE Department, University of California, Santa Barbara, CA 93106;

    ECE Department, University of California, Santa Barbara, CA 93106;

    ECE Department, University of California, Santa Barbara, CA 93106;

    Materials Department, University of California, Santa Barbara, CA 93106;

    Materials Department, University of California, Santa Barbara, CA 93106;

    ECE Department, University of California, Santa Barbara, CA 93106;

    Materials Department, University of California, Santa Barbara, CA 93106;

    ECE Department, University of California, Santa Barbara, CA 93106;

  • 会议组织
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
  • 关键词

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