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BAND OFFSETS IN GaN/AlN AND AlN/SiC HETEROJUNCTIONS

机译:GaN / AlN和AlN / SiC异质结中的能带偏移

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摘要

We have investigated the structural trends of the band offsets in GaN/AlN and AlN/SiC heterojunctions using the ab initio pseudopotential method. In the zincblende GaN/AlN (100), (110), and (111) heterojunctions, the band offsets are relatively insensitive to interface orientation. Bulk strain effects, however, can modify the offset by as much as 0.4 eV in coherently strained AIN/GaN and GaN/AlN (100) junctions. The band alignment in the heterovalent AlN/SiC (110) and (111) heterojunctions depends on the geometry and stoi-chiometry of the interface. Valence band offsets as high as 2.5 eV are obtained for neutral AlN/SiC(lll) junctions with a mixed Al/Si interface layer and as low as 1.3 eV with a mixed N/C layer. Atomic relaxation plays a major role in determining the offset. The change from zincblende (111) to wurtzite (0001) crystal structure in GaN/AlN and AlN/SiC heterojunctions selectively affects the conduction band offset, and has only a minor influence on the valence discontinuity.
机译:我们使用从头算伪电位方法研究了GaN / AlN和AlN / SiC异质结中带隙的结构趋势。在闪锌矿GaN / AlN(100),(110)和(111)异质结中,带隙对界面取向相对不敏感。然而,体相应变效应可以在相干应变的AIN / GaN和GaN / AlN(100)结中将偏移量修改多达0.4 eV。异质AlN / SiC(110)和(111)异质结中的能带排列取决于界面的几何形状和立体化学计量。对于具有混合的Al / Si界面层的中性AlN / SiC(III)结,可获得高达2.5eV的价带偏移,而对于混合的N / C层,可获得低至1.3eV的价带偏移。原子弛豫在确定偏移量中起主要作用。 GaN / AlN和AlN / SiC异质结中的闪锌矿(111)晶体向纤锌矿(0001)晶体结构的变化有选择地影响了导带偏移,对价态不连续性的影响很小。

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  • 来源
    《Nitride semiconductors》|1997年|911-916|共6页
  • 会议地点 Boston MA(US)
  • 作者单位

    Institut de Physique Appliquee, Ecole Polytechnique Federale de Lausanne, CH-1015 Lausanne, Switzerland;

    Biochemisches Institut der Universitat Zurich, CH-8057 Zurich, Switzerland;

    Institut de Physique Appliquee, Ecole Polytechnique Federale de Lausanne, CH-1015 Lausanne, Switzerland;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 材料;
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