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首页> 外文会议>Optical Microlithography XI >Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation
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Stability of optical interference coatings exposed to low-fluence 193-nm ArF radiation

机译：暴露于低通量193 nm ArF辐射的光学干涉涂层的稳定性

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Abstract: We report on our investigations on the long-term behavior of optical coatings under 193 nm laser irradiation in dependence on coating materials, radiation conditions, and substrate properties. A wide variety of different highly reflective dielectric mirrors and antireflective coatings, deposited by an ultra low loss evaporation process onto calcium fluoride and fused silica, has been tested. Irradiation experiments with highly reflective coatings show that fluoride coatings exhibit nearly no changes of their optical function in air as well as in argon atmosphere due to low initial absorption levels. Temporal atmospheric contaminations can be removed by using appropriate irradiation conditions. Oxide layers tend to post-oxidize during 193 nm exposure in air and the DUV absorption level will be reduced. Effectively, reflectance of multilayer coatings on the basis of oxide materials can be improved through laser irradiation. Irradiation experiments with antireflective coatings point out the dominant role of bulk and surface properties of the substrate for prolonged laser irradiation. In addition, we present laser induced damage thresholds to demonstrate upper limits of laser radiation resistance that can be achieved nowadays with several types of coatings. !14
机译：摘要：我们报告了我们对193 nm激光辐照下光学涂层的长期行为的研究，该行为取决于涂层材料，辐射条件和基材性能。已经测试了通过超低损耗蒸发工艺沉积在氟化钙和熔融石英上的各种不同的高反射介电镜和抗反射涂层。用高反射涂层进行的辐照实验表明，氟化物涂层由于在空气中以及在氩气气氛中的光学功能几乎没有变化，原因是初始吸收水平低。可以通过使用适当的辐照条件去除暂时的大气污染。氧化物层在暴露于空气中193 nm时倾向于后氧化，DUV吸收水平将降低。有效地，可以通过激光辐照提高基于氧化物材料的多层涂层的反射率。使用抗反射涂层进行的辐照实验指出了长时间激光辐照时基材的体积和表面特性的主要作用。此外，我们提出了激光诱导的损伤阈值，以证明当今可以通过几种类型的涂层实现的抗激光辐射的上限。 ！14

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