首页> 外文会议>Optical Microlithography XI >Benchmarking of software tools for optical proximity correction
【24h】

Benchmarking of software tools for optical proximity correction

机译:光学接近度校正软件工具的基准测试

获取原文
获取原文并翻译 | 示例

摘要

Abstract: The point when optical proximity correction (OPC) will become a routine procedure for every design is not far away. For such a daily use the requirements for an OPC tool go far beyond the principal functionality of OPC that was proven by a number of approaches and is documented well in literature. In this paper we first discuss the requirements for a productive OPC tool. Against these requirements a benchmarking was performed with three different OPC tools available on market (OPRX from TVT, OPTISSIMO from aiss and PROTEUS from TMA). Each of these tools uses a different approach to perform the correction (rules, simulation or model). To assess the accuracy of the correction, a test chip was fabricated, which contains corrections done by each software tool. The advantages and weakness of the several solutions are discussed. !7
机译:摘要:光学邻近校正(OPC)成为每种设计的常规程序的时机并不遥远。对于这样的日常使用,对OPC工具的要求远远超出了OPC的主要功能,该功能已通过多种方法证明并在文献中得到了很好的记录。在本文中,我们首先讨论生产OPC工具的要求。针对这些要求,使用市场上提供的三种不同的OPC工具(TVT的OPRX,aiss的OPTISSIMO和TMA的PROTEUS)进行了基准测试。这些工具中的每一个都使用不同的方法来执行校正(规则,仿真或模型)。为了评估校正的准确性,制造了一个测试芯片,其中包含每个软件工具所做的校正。讨论了几种解决方案的优缺点。 !7

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号